Inorganic process facilities:
- Lithography - ultimate resolution optical, nanoimprint and electron beam lithography
- Etching processes - wet etching, RIE and focussed ion beam milling (including dual beam FIB’s)
- Deposition - thermal and e-beam evaporators, DC and RF magnetron sputter systems, high temperature MOCVD, MBE, PECVD.
Organic processing facilities:
- Wet chemistry laboratories
- CVD systems and furnaces for nanotubes and nanowire growth
- Ink-jet printing facilities for organic electronics
Whether you are looking for novel organic or inorganic materials, require world-leading expertise in e-beam or photolithography, or need nanotube or nanowire morphologies, or prefer to develop devices using self-assembly, we can find the right experts to address your needs. The University has expertise in the fabrication of:
- Semiconductor devices – Si, SOI, SiGe, GaAs, AlGaAs, InP, GaN and diamond
- Thin Films – optical coatings, piezoelectric films, diamond-like-carbon, ferromagnetic and other materials can be produced using sputtering, CVD, thermal or e-beam evaporation, laser ablation, spray coating and sol gel processes.
- Nano-materials – carbon nanotubes (CNT’s), nanoflowers, graphene, ZnO, SiC, TiO2 and VO nanowires, quantum dots, sol gels, colloids and precursors
- Polymers and polymer films – conducting, liquid crystal, light emitting, light absorbing and inert polymers formed either through self assembly, ink-jet printing or soft nano-imprint lithography (NIL).
Once we have fabricated your devices, we can test them using a vast range of characterisation techniques to evaluate performance. Please see our characterisation section to find which techniques are available and may be suited to your needs.
If you would like more information on any equipment, usage costs or access please contact us. |