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The Nanoscience Centre

Cambridge University nanofabrication and characterisation facility

M Braun Glovebox with thermal evaporator

We have a positive pressure M'Braun glovebox system, primarily for making thin films of semiconducting polymer materials. We prepare solutions and spin under a nitrogen atmosphere, with oxygen and water levels limited to less than 10ppm.

For making devices, a K J Lesker thermal evaporator system is also available in the same glovebox. This is typically used for metals such as aluminium, gold, chromium and calcium, and also for the low temperature evaporation of organic semiconductor materials such as C60, pentacene and Alq3.


Beneq Atomic layer deposition system (ALD)

Atomic Layer Deposition (ALD) is a deposition technique which is based on alternating pulsing of two or more precursors. Due to the cyclic nature of ALD, it offers very high thickness control (angstrom resolution), uniformity over large areas and high conformality on non-planar substrates.

Our system is a TFS 200 from Beneq with a reactor that can handle up to 8'' wafers. We currently have the possibility to deposit Al2O3, TiO2 and ZnO using water as the oxygen source. Furthermore the machine has the capability to use O2 and ozone as oxygen sources and a plasma head to do PE-ALD at low temperatures.

We have recently installed a gas cabinet to allow the use of H2S which would allow users to deposit sulphide materials (after agreement with the manager).