The yellow lighting in Bay 1 is necessary for photolithography, so as to prevent unwanted exposure of photoresist to light of shorter wavelengths.
|Obducat Eitre Nano-Imprint Lithography
Individually or in combination with e-beam lithography, the Obducat Eitre NIL system can be used for large-area device nanofabrication. Nano Imprint Lithography (NIL) is an emerging lithographic technology that promises high throughput patterning of nanostructures. With NIL it’s possible to achieve sub-10nm resolution features over large areas. NIL can significantly simplify the production of nanostructures using a wide variety of materials. NIL intrinsically has better dimensional control that can be achieved using conventional UV lithography.